The first stand alone UHV Analytical FIB-SEM
- The vacuum level inside the main chamber is below 10-10 mbar
- UHV level is obtained after instrument baking at 120°C
- UHV require a specific design
- All materials constituting the instrument are chosen to limit contamination
Key Features of TESCAN NanoSpace
- Full UHV design – Contamination free environment
- Fully customisable system
- Total flexibility on FIB selection
- Enhanced surface analysis performances
- 100 mm sample stage
- Connectable to process clusters
Stage key features
- Full 100mm 6 axes stage.
- High repeatbility (optical encoders driven motors)
- Fully computer controled
- UHV compatible (contaminant free)
- Stability <2nm/min
- Integrated FC
- 1 kV isolated stage
SEM: Focused Elecron Beam
Eclipse + column.
UHV Design – Fully Bakeable 120°C
High resolution imaging..
High performance analysis.
- Energy range: 500 eV – 30 keV.
- Beam current: 5 pA to 100 nA.
The right column for the right application
Mono GIS UHV
NanoSpace can be equiped with 2 analytical devices (optional).
Upon customer requirements:
- Magnetic Sector SIMS add-on
- Ortho Time of Flight SIMS add-on